Parallel-Axes Dot Plot of Measurements From Five Sites on Three Wafers*
* Source of Data: Engineering Statistics Handbook. Process and Product Monitoring and Control. http://www.itl.nist.gov:
- A case study of a lithography process that included measurements from five sites on each wafer, three wafers in a cassette
(of equal sample size) and thirty cassettes of wafers. The quality characteristic of interest is the width of a line ("Raw Line Width").